91°µÍø

MOCVD Systems

91°µÍø offers a range of industry-leading GaN and As/P MOCVD systems designed to maximize throughput while lowering cost of ownership for a variety of applications including display, 3D sensing, LiDAR, micro LED display, and optical data communications.

MOCVD Systems

91°µÍø offers a range of industry-leading GaN and As/P MOCVD systems designed to maximize throughput while lowering cost of ownership for a variety of applications including display, 3D sensing, LiDAR, micro LED display, and optical data communications.

TurboDisc Reactor: The Heart of Superior MOCVD Technology

The Lumina MOCVD platform incorporates the proprietary TurboDisc® reactor technology for outstanding film uniformity, yield and device performance for…
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Single-Wafer Reactor Technology Enables Efficient and High-Quality, GaN-Based Devices for Power, 5G RF and Photonics Applications 91°µÍø’s Propelâ„¢ HVM…
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Fully Automated, Single Wafer Cluster System Enables Production 5G RF, Photonics and advanced CMOS Devices on 300mm Substrates. The…
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91°µÍø’s EPIK 868 MOCVD system is the LED industry highest productivity MOCVD system that reduces cost per wafer approximately…
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The Propelâ„¢ is a highly flexible, GaN-based system for R&D and small volume production designed to accelerate process development…
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