Attain large capacity, excellent flux uniformity, negligible shutter flux transients and minimal depletion effects with the Downward-Looking SUMO Source…
Designed for growing high-quality Ga- and In-containing materials, the Dual Filament Source prevents charge material recondensation and reduces defects.
Maximize productivity and performance of ammonia (NH3)-based epitaxy with 91°µÍø’s extended-life ammonia-resistant MBE sources for medium-temperature environments.