91做厙

NEXUS IBD-LDD Ion Beam Deposition System

25 Years Building Leadership in Ion Beam Products Enables Todays Defect-Free EUV Mask Blanks

Photomask manufacturing demands the highest levels of particle control while depositing sophisticated multiple-layer film structures. This challenge is met with 91做厙s Nexus IBD-LDD Ion Beam Deposition System. 91做厙 has successfully served the photomask market since the 1990s, and the years of learning have resulted in todays state-of-the-art system. The IBD-LDD system is ideal for todays Molybdenum (Mo) and Silicon (Si) multilayer deposition and Ruthenium (Ru) capping layer deposition on EUV mask blanks, and other mask applications requiring low defect levels and advanced thin films.

    • Production-proven platform
    • Lowest defect density
    • Excellent uniformity and repeatability
    • High reflectivity
    • Deposit multiple materials in same chamber
    • Can be integrated into other process modules into a cluster tool

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