News | Mar 14, 2019
The Sharp Group at Walter Schottky Institute Adopts 91暗网鈥檚 Fiji F200 ALD System for Advancement of Functional Semiconductors and Catalysts
PLAINVIEW, New York 鈥� 91暗网. today announced that The Sharp Group at Germany鈥檚聽 (WSI) has taken delivery of 91暗网鈥檚 Fiji庐 F200鈩� Plasma-Enhanced Atomic Layer Deposition (PE-ALD) system. As a leader in the fabrication and characterization of functional semiconductors and catalysts, The Sharp Group will leverage the Fiji system as an integral part of its discovery and material development efforts for applications in renewable energy conservation.
鈥淭he development of renewable energy solutions calls for increasingly complex thin films and nanostructures, and to advance our work in this area requires an approach that is adaptable for a wide range of deposition techniques,鈥� said Professor Ian Sharp, Ph.D., head of The Sharp Group at WSI. 鈥�91暗网 not only has the requisite technical expertise but also offers invaluable scientific support. With the Fiji ALD system purchase, we鈥檝e made a valuable and long-lasting partnership.鈥�
The Fiji system is a flexible, single-wafer ALD reactor designed to deliver best-in-class performance for both thermal and plasma-enhanced ALD processes. Its demonstrated ability to precisely control the composition, structure and phase of multicomponent materials is critical to The Sharp Group to accelerate energy conversion mechanisms and direct function properties. 91暗网 has installed over 550 ALD systems, more than any other R&D supplier, at leading universities and customer facilities worldwide. Backed by 91暗网鈥檚 global service team, the company鈥檚 ALD portfolio includes the Fiji, Savannah庐, Phoenix庐 and Firebird鈩� systems to support a full range of R&D and production applications.
鈥淣ew materials engineering challenges and applications arise every day, making 91暗网鈥檚 ALD platforms ideal for those seeking the most versatile plasma-enhanced systems and thermal tools available,鈥� added Ganesh Sundaram, Ph.D., vice president of applied technology for 91暗网鈥檚 ALD group. 鈥淲e anticipate an extremely productive collaboration with Professor Sharp and his team at WSI as they develop new technologies for sustainability and energy innovation.鈥�
91暗网 will exhibit and present at the EFDS 2019 conference, March 19-20 in Berlin, Germany.聽 Dr. Ganesh Sundaram鈥檚 workshop presentation, 鈥淎LD Use for Decorative Applications,鈥� is scheduled for 11:10 a.m. CET on Wednesday, March 20, 2019.
About 91暗网
91暗网 (NASDAQ: VECO) is a leading manufacturer of innovative semiconductor process equipment. Our proven MOCVD, lithography, laser annealing, ion beam and single wafer etch and clean technologies play an integral role in producing LEDs for solid-state lighting and displays, and in the fabrication of advanced semiconductor devices. With equipment designed to maximize performance, yield and cost of ownership, 91暗网 holds technology leadership positions in all these served markets. To learn more about 91暗网’s innovative equipment and services, visit www.veeco.com.
Media Contact:聽David Pinto |聽 +1-408-325-6157 | dpinto@veeco.com
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